Mask designMany of the processes described in this document involve some form of photolithography; which requires masks. The design of photolithography masks for micromachining is generally fairly straightforward. Normally, designs incorporate relative large structures (1-10um +) compared to the sub-micron structures that are now incorporated into advanced VLSI technologies. All that is required is some suitable CAD (computer aided design) software, and a platform to run it on. |